C P-LOK
USPTO Trademark Record · Serial No. 77192004
Trademark details
It was initially claimed by Air Products and Chemicals, Inc. on 20070529.
That brand applies to the following goods and services:Chemicals for use in the manufacture of low dielectric insulating film for use in semiconductors and integrated circuits; chemicals in the nature of porogens, namely, decomposing chemicals for forming pores in low dielectric insulating film; post chemical mechanical planarization (CMP) cleaning chemical preparations for removing slurries and polishing debris.
Currently that trademark is represented by trademark attorney(s): Geoffrey L. Chase.
You can learn more about that trademark on the USPTO website: View the USPTO record
Services available
Questions about this trademark?
If you have questions or issues related to the C P-LOK trademark — or to trademarks in general — our trademark attorneys can help. No appointment needed: call us or request a free estimate.
Register a Trademark Get a Free Estimate
