EXTREME LITHOGRAPHY trademarks under serial number 76310238. The goods are Software for electron beam writing and process technology, in particular for simulation and optimization of high resolution electron beam writing and of nanometer process technologies; master substrates for high resolution and ultra-high resolution replication technologies; measurement standard devices for nanometrology, namely measuring tools having a pattern in the micrometer or nanometer ranges, Custom manufacturing for others of structures having dimensions between 5mm and 250nm, namely, semiconductor, superconductors, molecular aggregates, polymer structures and metals, Services in the field of electron beam writing, namely, research, development, consulting and customized services provided for others via focused electrons relating to solid state substrates, for example, silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), silicon carbide (SiC), gallium nitride (GaN) and diamond; services in the field of process technology, namely, research, development and consulting services provided for others relating to structures between 5nm and 250nm; developme. Currently that trademark is represented by trademark attorney(s): Kenneth J. Mauer.

EXTREME LITHOGRAPHY

USPTO Trademark Record · Serial No. 76310238

Trademark details

EXTREME LITHOGRAPHY is a trademark. Serial number of that application is 76310238.

It was initially claimed by XLITH GMBH on 20010907.

That brand applies to the following goods and services:Software for electron beam writing and process technology, in particular for simulation and optimization of high resolution electron beam writing and of nanometer process technologies; master substrates for high resolution and ultra-high resolution replication technologies; measurement standard devices for nanometrology, namely measuring tools having a pattern in the micrometer or nanometer ranges, Custom manufacturing for others of structures having dimensions between 5mm and 250nm, namely, semiconductor, superconductors, molecular aggregates, polymer structures and metals, Services in the field of electron beam writing, namely, research, development, consulting and customized services provided for others via focused electrons relating to solid state substrates, for example, silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), silicon carbide (SiC), gallium nitride (GaN) and diamond; services in the field of process technology, namely, research, development and consulting services provided for others relating to structures between 5nm and 250nm; developme.

Currently that trademark is represented by trademark attorney(s): Kenneth J. Mauer.

You can learn more about that trademark on the USPTO website: View the USPTO record

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