XLITH trademarks under serial number 76310236. The goods are Software for electron beam writing and process technology, in particular for simulation and optimization of high-resolution electron beam writing and of nanometer process technologies; master substrates for high resolution and ultra high-resolution replication technologies; measurement standards for nanometrology, namely solid state substrates having a pattern in the nanometer or micrometer regime high-resolution masks and reticles, Custom manufacturing for others of structures having dimensions between 5nm and 250nm, namely, semiconductors, superconductors, molecular aggregates, polymer structures and metals, Services in the field of electron beam writing, in particular research, development, consulting and customized exposure via focused electrons on solid state substrates, for example, silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), silicon carbide (SiC), gallium nitride (GaN) and diamond; services in the field of process technology, in particular, research, development and consulting related to structures between 5nm and 250nm; development and support of software for electron beam w. Currently that trademark is represented by trademark attorney(s): Kenneth J. Mauer.

XLITH

USPTO Trademark Record · Serial No. 76310236

Trademark details

XLITH is a trademark. Serial number of that application is 76310236.

It was initially claimed by XLITH GMBH on 20010907.

That brand applies to the following goods and services:Software for electron beam writing and process technology, in particular for simulation and optimization of high-resolution electron beam writing and of nanometer process technologies; master substrates for high resolution and ultra high-resolution replication technologies; measurement standards for nanometrology, namely solid state substrates having a pattern in the nanometer or micrometer regime high-resolution masks and reticles, Custom manufacturing for others of structures having dimensions between 5nm and 250nm, namely, semiconductors, superconductors, molecular aggregates, polymer structures and metals, Services in the field of electron beam writing, in particular research, development, consulting and customized exposure via focused electrons on solid state substrates, for example, silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), silicon carbide (SiC), gallium nitride (GaN) and diamond; services in the field of process technology, in particular, research, development and consulting related to structures between 5nm and 250nm; development and support of software for electron beam w.

Currently that trademark is represented by trademark attorney(s): Kenneth J. Mauer.

You can learn more about that trademark on the USPTO website: View the USPTO record

Services available

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