SPIRE
USPTO Trademark Record · Serial No. 73529852
Trademark details
SPIRE is a trademark. Serial number of that application is 73529852.
It was initially claimed by SPIRE CORPORATION on 19850401.
That brand applies to the following goods and services:CHEMICALS AND CHEMICAL COMPOSITIONS, NAMELY, SEMICONDUCTOR, ELECTRONIC AND THIN FILM COMPOSITIONS, NAMELY, SILICON, PROCESSED AMORPHOUS SILICON, CAST SILICON SUBSTRATE, POLYSILICON FILM, RECRYSTALIZED THIN FILM SILICON, SILICON HETEROSTRUCTURES, EPITAXIAL SILICON FILM, GRAPHOEPITAXY, GALLIUM ARSENIDE, GERMANIUM, PLASMA DEPOSITED THIN FILM, CHEMICAL VAPOR DEPOSITED THIN FILM, VACUUM VAPOR DEPOSITEDTHIN FILM, ION IMPLANTED COMPOSITIONS, NAMELY, SILICON, PLATINUM, CHROMIUM, TANTALUM, CARBON, NITROG, THIN FILM, ION IMPLANTED COMPOSITIONS, NAMELY, SILICON, PLATINUM, CHROMINUM, TANTALUM, CARBON, NITROGEN, ALUMINUM, YTTRIUM, TITANIUM, ION BEAM DEPOSITION COMPOS, MANUFACTURING SYSTEMS, NAMELY, AUTOMATED AND MANUAL MANUFACTURING MACHINES FOR PRODUCTION OF SOLAR CELLS, PHOTOVATAIC ARRAYS AND PHOTOVOLTAIC MODULES, AND LAMINATING MACHINES, SCIENTIFIC, ELECTRONIC, AND PHOTOVOLTAIC SYSTEMS AND DEVICES, NAMELY, SOLAR CELLS, CONCENTRATOR SOLAR CELLS, THIN FILM SOLAR CELLS, SOLAR CELL MODULES, SOLAR CELL ARRAYS, ALL COMPOSED OF SILICON AND GALLIUM ARSENIDE; POWER TRANSISTORS, PRESSURE SENSORS, TEXTURE ETCHERS, PHOTODIODE ARRAYS, LIGHT EMITTING DIODES, METAL OXIDE SEMICONDUCTOR STRUCTURES, JUNCTION FIELD EFFECT TRANSISTORS, AND VARACTOR DIODES; AND, MATERIALS PROCESSING DEVICES, NAMELY, ION IMPLANTERS, PULSED ELECTRON BEAM PROCESSORS, E, PHYSICAL/CHEMICAL PROCESSING SERVICES, NAMELY, ION IMPLANTATION SERVICES, ION BEAM DEPOSITION SERVICES, EPITAXIAL DEPOSITION SERVICES, ION BEAM SPUTTERING SERVICES, PLASMA DEPOSITION SERVICES, PULSED ELECTRON BEAM PROCESSING, SEMICONDUCTOR DOSING SERVICES, MATERIAL WEAR TESTING SERVICES; SEMICONDUCTOR MATERIAL AND MODULE TESTING SERVICES.
Currently that trademark is represented by trademark attorney(s): THOMAS J. ENGELLENNER.
You can learn more about that trademark on the USPTO website: View the USPTO record
It was initially claimed by SPIRE CORPORATION on 19850401.
That brand applies to the following goods and services:CHEMICALS AND CHEMICAL COMPOSITIONS, NAMELY, SEMICONDUCTOR, ELECTRONIC AND THIN FILM COMPOSITIONS, NAMELY, SILICON, PROCESSED AMORPHOUS SILICON, CAST SILICON SUBSTRATE, POLYSILICON FILM, RECRYSTALIZED THIN FILM SILICON, SILICON HETEROSTRUCTURES, EPITAXIAL SILICON FILM, GRAPHOEPITAXY, GALLIUM ARSENIDE, GERMANIUM, PLASMA DEPOSITED THIN FILM, CHEMICAL VAPOR DEPOSITED THIN FILM, VACUUM VAPOR DEPOSITEDTHIN FILM, ION IMPLANTED COMPOSITIONS, NAMELY, SILICON, PLATINUM, CHROMIUM, TANTALUM, CARBON, NITROG, THIN FILM, ION IMPLANTED COMPOSITIONS, NAMELY, SILICON, PLATINUM, CHROMINUM, TANTALUM, CARBON, NITROGEN, ALUMINUM, YTTRIUM, TITANIUM, ION BEAM DEPOSITION COMPOS, MANUFACTURING SYSTEMS, NAMELY, AUTOMATED AND MANUAL MANUFACTURING MACHINES FOR PRODUCTION OF SOLAR CELLS, PHOTOVATAIC ARRAYS AND PHOTOVOLTAIC MODULES, AND LAMINATING MACHINES, SCIENTIFIC, ELECTRONIC, AND PHOTOVOLTAIC SYSTEMS AND DEVICES, NAMELY, SOLAR CELLS, CONCENTRATOR SOLAR CELLS, THIN FILM SOLAR CELLS, SOLAR CELL MODULES, SOLAR CELL ARRAYS, ALL COMPOSED OF SILICON AND GALLIUM ARSENIDE; POWER TRANSISTORS, PRESSURE SENSORS, TEXTURE ETCHERS, PHOTODIODE ARRAYS, LIGHT EMITTING DIODES, METAL OXIDE SEMICONDUCTOR STRUCTURES, JUNCTION FIELD EFFECT TRANSISTORS, AND VARACTOR DIODES; AND, MATERIALS PROCESSING DEVICES, NAMELY, ION IMPLANTERS, PULSED ELECTRON BEAM PROCESSORS, E, PHYSICAL/CHEMICAL PROCESSING SERVICES, NAMELY, ION IMPLANTATION SERVICES, ION BEAM DEPOSITION SERVICES, EPITAXIAL DEPOSITION SERVICES, ION BEAM SPUTTERING SERVICES, PLASMA DEPOSITION SERVICES, PULSED ELECTRON BEAM PROCESSING, SEMICONDUCTOR DOSING SERVICES, MATERIAL WEAR TESTING SERVICES; SEMICONDUCTOR MATERIAL AND MODULE TESTING SERVICES.
Currently that trademark is represented by trademark attorney(s): THOMAS J. ENGELLENNER.
You can learn more about that trademark on the USPTO website: View the USPTO record
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